| 초록 |
Block copolymers (BCPs) have attracted a lot of interest because they can provide an easy yet efficient way to fabricate well-ordered structures via their self-assembly property. Other them the simplest AB diblock, the self-assembled structure of ABC triblock copolymer is considerably more complex due to an increased number of variables. In this work, ABC triblock copolymers dissolved in various solvent were spin-coated on the silicon wafer and the structure change of thin films was investigated by adjusting the amount of solvent vapor, annealing time, or the type of solvent on annealing by using AFM and TEM. It was shown that the structure of triblock copolymer can be controlled by various factors, suggesting the potentials of triblock copolymers in various applications. |
