| 학회 |
한국고분자학회 |
| 학술대회 |
2013년 봄 (04/11 ~ 04/12, 대전컨벤션센터) |
| 권호 |
38권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Facile Fabrication of 100-nm class Lamellar Pattern using ARB Triblock Copolymer |
| 초록 |
Fabricating a self-assembled large domain pattern via linear block copolymer is difficult because the molecular weight (Mw) and domain spacing have a logarithmic relationship. Moreover, the micro phase separation of high Mw block copolymers is very hard via thermal annealing due to low chain mobility. Hence, the phase separation of 100 nm scaled block copolymer pattern via thermal annealing is practically impossible. To overcome the limitation of controlling the domain spacing, Grubb’s group suggested the bottle brush block copolymer. But, to synthesize the bottle brush block copolymer is very hard. In this system, we demonstrated a new way of fabricating large domain spacing patterns via thermal annealing with low Mw linear block copolymers. To control the domain spacing with low Mw block copolymers, we inserted random types of mid-blocks to adjust the chain stiffness. Using this ARB type block copolymer, we successfully fabricated 100 nm scaled lamella pattern via thermal annealing. |
| 저자 |
우상훈1, 정현중1, 이수미2, Craig J. HAWKER3, 허준4, 방준하5
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| 소속 |
1고려대, 2삼성전자, 3Deparment of Materials, 4UCSB, 5연세대 |
| 키워드 |
ARB triblock copolymer;
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| E-Mail |
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