| 초록 |
Nanopatterning is expected to play a major role in developing quantum devices and future optical devices. Especially, nanopatterns with high-resolution and high-aspect-ratio are being used efficiently in various fields as well as semiconductors. Methods such as nanoimprint and double patterning (DPT) are being used. However, due to the high cost and complexity of the process, it is difficult to apply it to various fields. On the contrary, "secondary sputtering lithography" (SSL) technology has been reported to be able to generate high-resolution and high-aspect-ratio patterns using ion bombardment technology, which is emerging as a next-generation nano-patterning technology. Here in, we introduce a new nanopatterning process that uses electrospinning and SSL to produce simple, economical, and large-area patterns. |
