| 학회 |
한국고분자학회 |
| 학술대회 |
2007년 가을 (10/11 ~ 10/12, 일산킨텍스) |
| 권호 |
32권 2호 |
| 발표분야 |
나노구조제어 및 분석기술 |
| 제목 |
Lateral phase separation of PS-b-PHOST diblock copolymer controlled by solvent vapor in a non-equilibrium state |
| 초록 |
We demonstrate the fabrication of highly ordered nano structures with lateral separation using a poly(styrene-block-4-hydroxylstyrene) (PS-b-PHOST) in a non-equilibrium state controlled by solvent vapor on organosilicate (OS) modified substrates with different surface energy via one step spin casting process. Both lamellar and cylindrical microstructures ordered perpendicular to the substrate were formed on an OS surface with high water contact angle of approximately 82°when the solutions were spin cast in the chamber saturated with their solvents. The structures were characterized with both AFM and Grazing Incident Small Angle X-ray Scattering. Subsequent solvent annealing after film formation also affects the orientation of the microstructures. We systematically investigate the effect of film thickness, temperature and solvent annealing time on the ordering of the block copolymers. |
| 저자 |
이근탁1, 윤보경1, 박철민1, 김호철2
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| 소속 |
1연세대, 2USA IBM Almaden research center |
| 키워드 |
nano-patterning; PS-b-PHOST; block copolymer; solvent vapor
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| E-Mail |
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