| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 봄 (04/10 ~ 04/11, 컨벤션 뷰로(대전)) |
| 권호 |
33권 1호 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Influence of topographic pattern geometry on controlled dewetting of poly(styrene-block-4-hydroxylstyrene) block copolymer thin film |
| 초록 |
We utilize pre-patterned substrates to investigate the influence of pattern geometry on dewetting of poly(styrene-b-4-hydroxylstyrene) diblock copolymer thin film. Dewetting of polymer film is induced by solvent vapor saturated via one step spin coating process. The ratio of period area to mesa one has been found as one of the most important factors to induce the dewetting. The dewetting of polymer thin film is initiated by the edge of the individual periodic lines, giving rise to the controlled dewet film with block copolymer nanostructure when the ratio is greater than 4 in our system. For the ratio of approximately 6, especially, nanoscaled dewetting morphology is formed at the center of mesa line. The similar influence of the ratio of period area to mesa one on dewetting of polymer thin film persist in the case of square-shaped mesa patterns, resulting in an intriguing morphology where sphere cap dewet domains are located with nanostructure on the center of individual square mesa. |
| 저자 |
이근탁1, 박철민1, 조필성1, 윤보경2, 김태희1, 히마드리1, 김호철3, 허준4
|
| 소속 |
1연세대, 2Univ. of Minnesota, 3IBM Almaden Research Center, 4서울대 |
| 키워드 |
block copolymer; dewetting; pattern; pre-pattern
|
| E-Mail |
|
