화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2007년 가을 (10/11 ~ 10/12, 일산킨텍스)
권호 32권 2호
발표분야 기능성 고분자
제목 A study on the synthesis of fluorinated polymers and application to photoresist for optical wave guide patternig.
초록 Fluorinated polymer materials have good thermal and chemical stability and a low propagation loss in the IR transmission window of optical communications systems. In this study, we synthesized Optopol-HSP-2 Polymer(Fluorinated Polymer) was added PAG(Photo Acid Generator), over-clad by using spin coater on Si wafer, then followed by photolithography process. The surface and profile textures were examined by alpha-step and SEM. Etching conditions were investigated according to etchant types. Resulting etching rates and etching textures of fluorinated polymer(Optopol-HSP-2 Polymer) could be explained by the factors of different polarity and solubility of etchant and polymer structure types.
저자 정진숙, 위성유, 이우균, 김진봉
소속 전남대
키워드 fluorinated polymers
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