초록 |
Fluorinated polymer materials have good thermal and chemical stability and a low propagation loss in the IR transmission window of optical communications systems. In this study, we synthesized Optopol-HSP-2 Polymer(Fluorinated Polymer) was added PAG(Photo Acid Generator), over-clad by using spin coater on Si wafer, then followed by photolithography process. The surface and profile textures were examined by alpha-step and SEM. Etching conditions were investigated according to etchant types. Resulting etching rates and etching textures of fluorinated polymer(Optopol-HSP-2 Polymer) could be explained by the factors of different polarity and solubility of etchant and polymer structure types. |