| 초록 |
Various acid modified ester acrylates were prepared from dianhydirdes and 2-hydroxyethyl acrylate. Physical properties such as hardness, yellowing, tensile strength and elongation were tested and compared as the structure of oligomer in cured-film differs. Photocharacteristics of this photoresist were investigated under irradiation of UV light. The photoresist showed good thermal stability, development properties, and high resolution because of the high crosslinking density. It was suggested that New type of photoresit resin can be applied as negative-acting liquid photoresist. |
