화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2010년 가을 (10/07 ~ 10/08, 대구 EXCO)
권호 35권 2호
발표분야 기능성 고분자
제목 Photoactive properties of Antimicrobial Poly(vinyl alcohol) Film with various Photo-sensitizers
초록 Antimicrobial PVA films containing various photo-sensitizers were prepared, and their structural and photoactive properties were investigated. 1-Hydroxycyclohexyl phenyl ketone, 4'-Hydroxyacetophenone, 2-Methyl-4'-(methylthio)-2-morpholinopropiophenone, 4,4'-Bis(dimethylamino)-benzophenone, Thioxanthen-9-one, and 4,4'-Dihydroxybenzophenone were selected as photosensitizing additives. Effect of types of photo-sensitizers, their concentration, and their combination in mixture on UV absorption and radical formation, thermal stability, and structural properties of prepared films were observed by DSC, UV-Vis, XRD, ESR. As results, under optimum condition, PVA film with the mixture of 1-Hydroxycyclohexyl phenyl ketone, 4'-Hydroxyacetophenone, and 4,4'-Bis(dimethylamino)-benzophenone showed highly sensitive photoactive properties over the wide range of UV wavelength. This research was supported by National Research Foundation of Korea (Project No. 2010-0008047)
저자 임기섭1, 오경화2, 김성훈1
소속 1한양대, 2중앙대
키워드 antimicrobial; poly(vinyl alcohol); photo-sensitizer
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