| 학회 |
한국화학공학회 |
| 학술대회 |
2011년 봄 (04/27 ~ 04/29, 창원컨벤션센터) |
| 권호 |
17권 1호, p.752 |
| 발표분야 |
재료 |
| 제목 |
Structural, morphological properties ofaluminum thin film incorporated on silicon wafer by various depositionmethods |
| 초록 |
Thin film of aluminum has a key role for the growth of carbon nanotubes and used as buffer layer between catalyst layer and silicon wafer. In this article we compared the morphology of Al layer on the Si wafer by using three different deposition methods: RF magnetron sputtering, thermal evaporation and DC magnetron sputtring. The influence of aluminum doping on to morphological properties, SEM, AFM and x-ray photoelectron spectroscopy properties has been investigated. The preparative parameters have been optimized to obtain good quality thin films in all the methods. The FE-SEM and AFM micrographs studies have also used to differentiate the surface morphology. It was observed that surface morphology of Al layer has a clear and significant impact on the growth of carbon nanotubes by chemical vapor deposition (CVD). The chemical composition and valence states of constituent elements are analyzed by x-ray photoelectron spectroscopy. |
| 저자 |
모흐드 나짐, 장영운, 임익태, 김종석
|
| 소속 |
전북대 |
| 키워드 |
surface morphology; carbon nanotubes; deposion methods; buffer layers
|
| E-Mail |
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| 원문파일 |
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