| 학회 |
한국공업화학회 |
| 학술대회 |
2011년 가을 (11/02 ~ 11/04, 경원대학교) |
| 권호 |
15권 2호 |
| 발표분야 |
나노 |
| 제목 |
CVD growth of alignedcarbonnanotubes: structure and morphologyof metal thin films |
| 초록 |
We study the surface morphology of aluminum and iron catalyst layer on the Si wafer. The thin film of aluminum has a key role for the growth of carbon nanotubes (CNTs) and used as buffer layer between catalyst and silicon wafer. The influence of aluminum doping on to Si wafer and its morphological properties have been invesigated using field emission scanning electron spectroscopy(FE-SEM), X ray photoelectron spectroscopy(XPS), and Raman spectroscopy.The atomic force microscopy(AFM) micrographs studies have also been used find out the structural and surface morphological effect on the growth of CNTs using thethermal chemical vapor deposition (TCVD) at750 oC. It was observed that surface morphology of Al layer has a clear and significant impact on the growth of coiled and vertically aligned CNTs forests by TCVD. |
| 저자 |
김종석, 모흐드 나짐, 임티아즈 마드니, 장영운, 임익태
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| 소속 |
전북대 |
| 키워드 |
surface morphology; carbon nanotubes; thin films; chemical vapor deposition
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| E-Mail |
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