화학공학소재연구정보센터
학회 한국화학공학회
학술대회 2008년 가을 (10/23 ~ 10/24, 부산 BEXCO)
권호 14권 2호, p.2394
발표분야 고분자
제목 A Novel Negative Photoinitiator-free Photosensitive Polyimide with a Low Dielectric Constant
초록 This article describes the preparation of a kind of photoinitiator-free photosensitive polyimide(PSPI). A group of novel auto-photosensitive polyimideswas prepared based on the flurorinated aromatic diamine 2,2’-bis(3-amino-4-hydroxyphenyl)hexafluoropropane diamine (AHHFP) and 3,3’,5,5’-benzophenonetetracarboxylic dianhydride (BTDA). other polyimideswere synthesized by copolymerization of 4,4’-(hexafluoroisopropylidene)diphthalic anhydride (6FDA) to more decrease dielectric constant and coefficient of thermal expansion.Thepolyimides wereacrylated via a reaction with acryloyl chlroride in the presence of triethyl aminefor the modification of aromatic polyimides. The chemical structure of the resulting polymer was confirmed by 1H NMR and Fourier transform infrared spectroscopy. The samples were characterized by UV analysis, thermogravimetric analysis (TGA) andthermomechanical analysis (TMA), dielectric constant, and so on. Photocuring was tested by lithography. The image was shown by the scanning electron micrograph (SEM).
저자 전지희, 이석규, 최준석, 한학수
소속 연세대
키워드 Photosensitive; copolymer; Dielectric constant; lithography
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