| 초록 |
Films of block copolymer micelles generated via self-assembly in a selective solvent can provide easy way to fabricate well-organized, functional structure on the nanometer scale applicable to a variety of fields. In order to realize the potentials for their utilization, various methods to be able to control the nanostructure of block copolymer micellar thin films should be developed. In this work, the micelles of PS-b-PDMS diblock copolymer are formed in their selective solvent (dimethylformamide) and the effects of the processing parameters and experimental conditions on their nanostructure in thin films are investigated. Here PS-b-PDMS was chosen for generation of silica nanostructure via oxygen plasma treatment. Micelles are deposited on the substrate via drop-casting under different processing conditions. Samples were exposed to solvent vapor to improve order of micelles. And, It was found that the nanostructure of micelles can be manipulated by controlling the various parameters. |
