| 초록 |
Block copolymer micellar films generated via self-assembly in a selective solvent can provide simple way to produce well-organized, functional structure on the nanometer scale applicable to a variety of fields. Micelle structures of block copolymer are greatly affected by type of a selective solvent. Therefore, morphologies of block copolymer micelles are controlled by changing a selective solvent. As model systems, in this work, the micelles of PS-b-PDMS block copolymer are formed various selective solvents and the effects of the processing parameters and experimental conditions on their nanostructure in thin films are investigated. Here PS-b-PDMS was chosen for generation of silica nanostructure via plasma treatment. Micellar solutions are coated onto the substrate via spin-coating and dip-coating under different processing conditions. It was found that the nanostructure of micellar films can be manipulated by controlling the various parameters. |
