| 초록 |
It is well known that polyimides provide low dielectric constant and good surface properties. Fluorination is one of the methods to decrease the dielectric constant of polyimides. In this work, the surface and dielectric properties of polyimide thin film treated by fluorination were investigated. The influence of fluorination treatment on surface properties of polyimide thin films isstudied in terms of X-ray photoelectron spectroscopy (XPS) and contact angles. And, the dielectric properties of polyimide thin films are analyzed using a dielectric spectrometer. As a result, it is found that the increasing rate of fluorine functional groups onto the thin film surfaces increases as a function of the treatment temperature, resulting in decreasing the dielectric constant. These results can be explained that the development of fluorine functional groups leads to a significant increase of the amount of fraction free voulme existing in the polyimide backbone structure.
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