| 학회 |
한국고분자학회 |
| 학술대회 |
2010년 봄 (04/08 ~ 04/09, 대전컨벤션센터) |
| 권호 |
35권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Micro-patterning of Block Copolymer Photonic Gels |
| 초록 |
Photonic crystals have been widely investigated not only because of their unique optical properties but also because of their potential applications in sensors, electronics and optics. For practical applications, creating fine patterns on the photonic crystals are required along with the capability of tunning of photonic stop bands. In this presentation, we report capability of forming fine patterns on block copolymer photonic gel films and their optical responses. We found that PS-b-P2VP block copolymer photonic gel films can be crosslinked by exposure of UV, and the position of photonic stop bands can be tunned accordingly. We demonstrate that multi color patterning on the photonic gel films can be readily achievable by applying the conventional photolithographical techniques. Furthermore, we show that the photonic gel films can be used as photographic films by combining photolithography with inorganic fixation process which we have previously reported. |
| 저자 |
김은주, 장유림, 김대현, 강창준, 정재연, 지승욱, 강영종
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| 소속 |
한양대 |
| 키워드 |
self assembly; block copolymer; photolithography
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| E-Mail |
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