| 초록 |
To develop a solvent soluble, positive type photosensitive copolyimide containing cyclobutane groups, poly(urethane-imide)s (PUI)s, was prepared through the polycondensation reaction of N-methylol maleimide cyclobutane dimer (MCD) with 4,4’-diphenylmethane diisocyanate or 2,4-toluene diisocyanate, and their photodegradation reactions were studied from the changes in the UV and IR absorption spectra and from analysis of the photolysis products of its model compound by HPLC. They were not soluble in acetone or 0.1 N NaOH before irradiation, but they became soluble after irradiation with 254 nm UV light. The relative rate of photo-decomposition of the functional groups in the PUI increased in the order urethane ＜ imide ＜ cyclobuane groups. A positive type micropattern with a line width of 1 μm could be obtained on the PUI film using 0.1 N NaOH solution. Thus, the prepared PUIs could be used as soluble, positive type photosensitive copolyimides which could be developable in alkali. |
