| 학회 |
한국화학공학회 |
| 학술대회 |
2015년 봄 (04/22 ~ 04/24, 제주 ICC) |
| 권호 |
21권 1호, p.879 |
| 발표분야 |
재료 |
| 제목 |
Low cost and highly reliable fabrication process of nanodevice for bioapplications |
| 초록 |
Nano-devices have attracted strong interest in various research fields such as energy and life science. Even though the promising applications using this platform have demonstrated so far, these research fields still suffer from the absence of robust and low cost fabrication processes. To address these issues, this work presents novel fabrication process of nanodevice based on direct patterning using sequential processes of nanoimprinting and plasma etching. It was found that different plasma etch conditions after nanoimprinting can generate nanodevice with various surface characteristics, resulting dominant effects of device performance. Especially, this work focused on ZnO nanowire field-effect transistors (NWFETs) fabricated by this approach. The systematic analysis of plasma etching effects in this nanodevice will be discussed. |
| 저자 |
정희춘1, 김진태1, 유찬석1, 안의진1, 유혜성1, 이수한2, 최대근2, 임연호1
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| 소속 |
1전북대, 2한국기계(연) |
| 키워드 |
nanoimprinting; field effect transistor; ZnO
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| E-Mail |
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| 원문파일 |
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