| 학회 |
한국화학공학회 |
| 학술대회 |
2015년 가을 (10/21 ~ 10/23, 일산 KINTEX) |
| 권호 |
21권 2호, p.2032 |
| 발표분야 |
재료 |
| 제목 |
Nano-imprinted nanowire device coupled with plasma process for chemical and biological sensors |
| 초록 |
Semiconductor nanowire field effect transistors (NWFETs) have attracted strong research interest as a platform for the construction of chemical and biological sensors. Despite a wide range of potential applications, development of the cost effective and mass-producible fabrication routes remains a significant challenge. To address these issues, we developed a novel fabrication method based on plasma processing of etching and deposition, consisting of sequential processes of metal oxide (ZnO) deposition, nano-imprint lithography, low-damage plama etching, and non-thermal plasma deposition. This works demonstrates that the benefits of plasma process play a great role in finding breakthrough of the conventional nanobiosensor. Based on plasma processes compatible with conventional semiconductor processes, a novel process is proposed for cost effective fabrication of mass producible NWFET biosensor. Furthermore, it is demonstrated that the optimized ZnO NWFET device with effective surface functionalization (a-Carbon, Teflon-like Carbon) can be good alternative for the functionalization platform of the conventional NWFET sensors. |
| 저자 |
임연호1, 최대근2, 이수한2, 양영석3, 정종혁3, 안의진1, 정희춘1, 김진태1, 유찬석1
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| 소속 |
1전북대, 2한국기계(연), 3우석대 |
| 키워드 |
nanowire sensor; ZnO nanowire; top-down approach
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| E-Mail |
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| 원문파일 |
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