| 학회 | 한국재료학회 |
| 학술대회 | 2013년 봄 (05/23 ~ 05/24, 여수 엠블호텔(THE MVL)) |
| 권호 | 19권 1호 |
| 발표분야 | B. 나노재료(Nanomaterials) |
| 제목 | Direct Imprinting Lithography Combined Reverse Transfer Method Using Silver Metal Ink for Residues-free Layer |
| 초록 | Nano-imprinting is one of the non-photolithographic patternings that directly transfer materials to substrates. With the direct nano-imprinting using nano metal particles, nano-scale structures such as nano-wire arrays for metal-insulator-metal structure have been investigated. This technique is the low cost and effective method for manufacturing the functional and complicated nano-structures for electronic devices. However, it has some issues like residues in the connecting area between lines and lines used for individual electrode of electronic devices. These residue-free nano-scale structures could be achieved by adjusting a variety of process parameters such as temperature and pressure during nano-imprinting process. In this study, we have studied how to attain residue-free metal patterns using metal ink by nano-imprinting technique. Process parameters including volatile temperature for solidified metal ink, processing pressure and temperature were varied. Firstly, we prepared combined flexible mold - patterned hard polymer material (Polyurethane acrylate: PUA) through the hole pattern (Diameter: 200nm / Space: 100nm / Depth: 100nm) and line pattern (Width: 100nm, 600nm / Space: 100nm / Depth: 200nm) of the silicon template on the flexible back plate (Polydimethylsiloxane: PDMS). After fabricating the patterned mold, we filled engraving sites of patterned mold with silver metal ink solution (low viscosity: 10~17cPs). For baking temperatures, with hole and line patterns, residues were observed while there were no residues over 80°C. Nano-imprinting process reveals out that residues are strongly related with applied pressure. Below 5 atm, no patterns were attained due to low binding force among nano-particles while pressure exceeded 15 atm caused severe damage on the pattern. In our experiment, 10 atm was a sweet point to achieve successful line pattern without any residue. Regarding for liquid bridging temperature, no line patterns were attained over 80°C while pattern results were fairly good with 70°C. These results suggest that the binding force of nano-particle to maintain the nano-scale pattern is substantially determined by the combined parameters between the pressure (10 atm) and temperature (70°C). This research was supported by the Pioneer Research Center Program through the National Research Foundation of Korea funded by the Ministry of Education, Science and Technology (2012-0009460) |
| 저자 | 김도형, 길영인, 유동준, 최문석, 임동환, 정철원, 최창환 |
| 소속 | 한양대 |
| 키워드 | nano imprinting; |
