| 초록 |
Components consist of quartz need more plasma resistance to improve their life time in plasma processing chamber. To increase the plasma resistance, it is necessary to develope new materials or processing techniques. Aerosol deposition (AD) method has been studied as a technique to form a dense coating layer at room temperature without any additional processing in vacuum. AD process has also quick coating time and proper adhesion. In this study, amorphous layers using the SiO2-Al2O-Y2O3 glass with various process conditions were coated on quartz substrates by AD method. Their thickness and plasma etching rate compared with quartz were measured by alpha-step, and scanning electron microscopy was used to investigate the microstructure of the surface and cross section. Coaitng adhesion between coating layer and substrate was tested by universal testing machine. The results showed that coating layer changes according to process conditions and has a higher plasma resistance thacn quartz. These fundamental experiments can be helpful to the improvement of the plasma resistance of quartz and its fabrication. |
