| 학회 |
한국공업화학회 |
| 학술대회 |
2011년 가을 (11/02 ~ 11/04, 경원대학교) |
| 권호 |
15권 2호 |
| 발표분야 |
나노 |
| 제목 |
Hydrophobic behavior of nanoporous silica aerogel thin film |
| 초록 |
Silica was prepared by sol-gel process at ambient pressure drying (APD) using silicic acid. The silicic acid containing 8wt% of SiO2 was significantly obtained from silicate solution throughremoval of Na+ using Amberite as an ion exchange resin. The formation of Nanoporous silica aerogel thin films (NSATF) was achieved by applying the preformed gel on a glass substrate. The surface modification with trimethychlorosilane (TMCS) was followed to improve hydrophobic properties of the silica aerogel thin film. The hydrophobicity was observed by contact angle measurement. Transparency and morphology of the aerogel thin films were obtained by UV spectrometer and FE-SEM. |
| 저자 |
김유나, 심영호, Godlisten N. Shao, 프라딥, 전순정, 김희택
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| 소속 |
한양대 |
| 키워드 |
Aerogel thin film; Sol-gel method; Ambient pressure drying; Hydrophobicity
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| E-Mail |
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