| 초록 |
Block copolymers are well-known for their self-assemble property and for the potency to be used in nanopatterning. LB method is a very powerful way to produce ultrathin, patterned film of these polymers. There have been numerous researches about the film formation of diblock copolymers through LB method as well as theoretical studies, yet it is still not clear how triblock copolymers form films at an interface. Since triblock copolymers’ system has higher complexity than diblock copolymers’, we may expect different morphological development. In this study, we tried to understand LB film formation of PMMA-PS-PMMA and compared it with PS-PMMA. π-A isotherms and AFM images of the films reveals that the triblock copolymer film has larger limiting area and more regular morphology film due to higher degree of restriction on the aggregation of PS blocks by PMMA blocks of both sides of the polymer chains. |
