| 초록 |
Ag NWs network film with the improved mechano-electric flexibility was prepared by judicious regulation of the crystallinity of nanowires. After the systematic bending-fatigue study of Ag NWs network and its electronic device applications on patterned electrode, the mechano-electric stability of Ag NWs network film is found to be highly associated with their crystalline structural deformation by externally applied strains. Based on this result, c-Ag NWs are prepared by the solution based thermal annealing at 70 oC and integrated into c-Ag NWs network film. By analyzing crystalline structures and nano-morphologies, as-formed c-Ag NW network film exhibits enhanced crystallinity and reduced dislocation density. In the bending fatigue tests under application of strain (6.7%, bending radius: 1 mm) during the 200,000 cycles, c-Ag NWs network film shows highly reduced (＞500%) resistance change (ΔR/ΔRo: 45%) than that of pristine Ag NW network film (ΔR/ΔRo: 241%). |
