화학공학소재연구정보센터
학회 한국재료학회
학술대회 2017년 봄 (05/17 ~ 05/19, 목포 현대호텔)
권호 23권 1호
발표분야 B. 나노화학/바이오 분과
제목 Nano-Scaled Silver Metal Cross Array Fabrication Using Nano-Imprint Lithography on the PET Substrate
초록 By using nano-imprint process, we demonstrated the metal line cross-array on the flexible PET substrate without any vacuum process and photolithography process. To overcome the isssue related with the removal of metal residue, which is done with additional etching process in the typical nano-imprint lithography method, we adopted solution-based siliver nano particle combined with the effect of a capillary force. By modifiying the surface energy with an appropriate SAM treatment, we successfully achieved the metal line cross array with dimension size less than 500 nm.

[Acknowledgement] This study was supported by the Future Semiconductor Device Technology Development Program (10044842) funded by MOTIE (Ministry of Trade, Industry & Energy) and KSRC (Korea Semiconductor Research Consortium) as well as the Industrial Technology Innovation Program (10054882, Development of dry cleaning technology for nanoscale patterns) funded by the Ministry of Trade, Industry and Energy (MOTIE, Republic of Korea)
저자 Yu-Rim Jeon1, Young In Gil2, Donghwan Lim1, Hoon Hee Han2, Changhwan Choi1
소속 1Division of Materials Science and Engineering, 2Hanyang Univ.
키워드 Nano Imprint; Ag Nano-Particle; Metal Array
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