| 학회 | 한국재료학회 |
| 학술대회 | 2018년 가을 (11/07 ~ 11/09, 여수 디오션리조트) |
| 권호 | 24권 2호 |
| 발표분야 | G. 나노/박막 재료 분과 |
| 제목 | Evaluation of a photomask with a new functional coating that drastically reduces contamination |
| 초록 | In contact or gap sensor type photolithography process, there is a problem, that is photoresist residual or foreign particle in air are easily attached on photomask surface, due to repeatably attach and detach between photomask and photoresist on substrate. Photomask user should enhance the photomask cleaning process and have the cleaning machine because of this matter. We have solved this problem with anti-fouling coated photomask that can be cleaned very easily by only dried wiper without typical cleaning chemical. This solution provides the 200% particle removing performance than existing photomask and improves the safety and hazard of worker by eco-friendly process. Besides it is possible to shorten the time loss due to cleaning process and reduce the production cost by eliminating the need for cleaning equipment. In addition to, above all we confirmed the fact that final yield of product which manufactured by lithography process is improved with anti-fouling coated photomask. |
| 저자 | Byeongkyou Jin1, Jangsik In2, Daeyeol Yang3, Ahyun Kwon4, Jungchul Park1 |
| 소속 | 1NEPCO Co., 2Ltd., 3Korea, 4Republic of |
| 키워드 | Photolithography; Photomask; Cleaning; Anti-fouling; nano coating |
