| 학회 | 한국고분자학회 |
| 학술대회 | 2004년 가을 (10/08 ~ 10/09, 경북대학교) |
| 권호 | 29권 2호, p.286 |
| 발표분야 | 기능성 고분자 |
| 제목 | Fluorescent Photoimag of Polymers Having tBOC-protected Quinizarin Dye Precursors by Chemical Amplification Lithography |
| 초록 | We have reported a novel photoimaging method that has been developed by taking advantage of a photolithographic technique based on the chemical amplification (CA) concept using the tert-butyloxycarbonyloxy (tBOC) protected quinizarin [tBOC-Qz] dyes. In a CA process, the acid produced by a photochemical reaction with a photoacid generator (PAG) induces a cascade of subsequent chemical transformation through acid-catalyzed deprotection of the acid-labile tBOC protecting groups during a post-exposure bake (PEB) step in polymers having tBOC-Qz dye precursors as shown in Figure 1. In this presentation, a novel styrene monomer tBQzSt having the acid-labile tBOC-Qz group as a pendent, has been copolymerized with vinyl monomers to apply for fluorescent photoimaging by a dry process. Photoimaging capabilities of the tBQzSt copolymers having the masked tBOC-Qz groups were investigated for applications as latent photoimaging materials. UV spectral changes of P(tBQzSt/MMA)[50:50] with 5% PAG in films were depicted in Figure 2 after exposure to deep UV and PEB at 120 ℃ depending on the irradiation time increased by arrow direction for 0, 2, 4, 6, and 7 sec until no more change. The strong UV absorption at 340nm owing to the tBQzSt units of the polymer A disappeared and a new maximum absorption band at 480nm along with strong fluorescence emission around 580nm appeared for confirming the recovery of the original quinizarin dye moieties in the polymers B. Photoimaging capabilities of the polymeric quinizarin dye precursors were investigated for application as latent color and fluorescent photoimaging materials. Solutions of P(tBQzSt/MMA) containing tripheylsulfonium triflate (TPSOTf) as a PAG spin-cast to form 0.8μm thick films on substrates. The polymer films were imagewise-exposed by UV irradiation through a photomask followed by post-exposure bake (PEB) at 120 ℃ for finishing the chemical transformation process. The fluorescent photographs exhibited bright yellowish patterns at the irradiated portions in which efficient removal of the acid-labile tBOC groups occurred by a CA process. Figure 1. Figure 2. References 1. K.-D. Ahn, C.-M. Chung, D. I. Koo, Chem. Mater., (1994), 6, 1452. 2. K.-D. Ahn et al., Chem. Mater., (1998), 10 , 2332. 3. K.-D. Ahn et al., Angew. Chem. Int. Ed., (2000), 39, 1780. 4. A. M. Vekselman, C. Zhang, G. D. Darling, Chem. Mater., (1997), 9, 1942. 5. H. J. Ito, Polym. Sci., Polym. Chem., (2003), 41, 3863. 6. K.-D. Ahn, et al. Chem. Lett., (2001), 30, 716. 7. K.-D. Ahn, et al. Macromol. Res., (2003), 11, 69. 8. C. Kocher, et al. J. Mater. Chem., (2003), 13, 9. |
| 저자 | 유경욱1, 주동준1, 강종희2, 한동근2, 안광덕2 |
| 소속 | 1경희대, 2한국과학기술(연) |
| 키워드 | Quinizarin |
