| 학회 |
한국고분자학회 |
| 학술대회 |
2007년 봄 (04/12 ~ 04/13, 제주 ICC) |
| 권호 |
32권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Top Surface Imaging by Selective Adsorption of Polydimethylsiloxane |
| 초록 |
A new top surface imaging process has been developed in which a silicon-containing compound is adsorbed selectively on a patternwise exposed non-chemically amplified resist film. The polymer containing diazoketo groups which undergo the Wolff rearrangement upon irradiation in the Deep UV were synthesized. Deep UV light irradiation with mask renders the exposed regions hydrophilic by the formation of carboxylic groups. Polydimethylsiloxane is selectively located at the exposed region by amide bonding formation. The negative tone images featuring 0.3 μm line and space patterns were observed after oxygen reactive ion etching. In this system, we could avoid the problems of chemically amplified resists system and take the advantages of top surface imaging. Also, this work is meaningful as a green chemistry since there is no development step using organic solvent. |
| 저자 |
윤슬기, 김진백
|
| 소속 |
한국과학기술원 |
| 키워드 |
top surface imaging; diazo-keto
|
| E-Mail |
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