| 학회 |
한국고분자학회 |
| 학술대회 |
2021년 봄 (04/07 ~ 04/09, 대전컨벤션센터) |
| 권호 |
46권 1호 |
| 발표분야 |
고분자합성 |
| 제목 |
Molecular materials Containing a Large amount of Iodine as a Sensitizer to Improve the Performance of Extreme UV Resist |
| 초록 |
Extreme ultraviolet light at 13.5 nm can implement finer circuit patterns than ArF (193 nm) light sources, but the number of photons absorbed per unit area is only 1/14, which deteriorates the characteristics of the resist. We synthesized a molecular material having a cyclic acetal structure using three benzaldehyde derivatives based on the vascular contrast agent molecule for computed tomography (CT) containing a lot of iodine with high absorbance. The synthesized material has excellent solubility in a resist coating solvent and is changed to a water-soluble structure through an acid-catalyzed decomposition reaction. the synthesized molecular iodide material is mixed with a resist polymer and Photoacid generator (PAG) and formed into a thin film. under extreme ultraviolet patterning conditions, The Line-edge roughness (LER) and sensitivity have obtained the patterning of improved result than the comparison group that does not contain this. |
| 저자 |
박한빛, 이진균, 구예진
|
| 소속 |
인하대 |
| 키워드 |
EUV lithography; Sensitizer; photoresist
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| E-Mail |
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