| 초록 |
Modifying interface topography is an effective way to control an orientation of soft materials, such as block copolymer (BCP) self-assembly, liquid crystal alignment, and polymer crystallization. In this study, we investigated an effect of an anisotropic roughness of substrates on an in-plane domain orientation of BCP self-assembly in thin films. To create the uniform and reproducible anisotropic roughness on substrates, a nanoscratching method was employed: a scratching with a commercial diamond lapping film on target substrates forms the anisotropic roughness referred as the nanoscratch. We found that the nanoscratch effectively directs the self-assembly of BCP thin films in a large area, thus enabling a wafer-scale directed self-assembly (DSA). Moreover, the nanoscratch-DSA can be applied to various substrates in a large area including ceramics, metals, metal oxides, and inorganic materials and can select the area to be patterned in nanoscales by controlling the scatch direction. |
