| 초록 |
A chemically defined patterned surface was non-conventionally created via combined process of flow-enabled self-assembly of polymer strips and selective physical absorption. The former process involved litho-free patterning of poly(methyl methacrylate) (PMMA), thus forming PMMA strips over larger areas, whereas the latter process was based on physical adsorption of PMMA segments into silicon oxide surface, thus forming ultrathin PMMA strips. The resulting alternating PMMA-rich and oxide strips served as a guiding template for directed self-assembly of high polystyrene-block-polydimethylsiloxane (PS-b-PDMS) and polystyrene-block-poly(ferrocenyl dimethylsilane) (PS-b-PFS) in a simple and facile manner, dispensing the need for conventional lithography techniques. Subsequently, deep reactive ion etching and oxygen plasma treatment enabled the transition of the PDMS and PFS blocks into oxidized nanodot arrays in spatially-ordered strip patterns. |
