화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2017년 봄 (04/05 ~ 04/07, 대전컨벤션센터)
권호 42권 1호
발표분야 대학원생 구두발표 (영어발표, 발표15분)
제목 Robust Superomniphobic Surfaces Created by Localized Photofluidization of Azopolymer Micropillars
초록 Robust superomniphobic surfaces are created by designing doubly re-entrant structures in azopolymer micropillar array. Localized photofluidization reconfigures the micropillars to have doubly re-entrant geometries, which serve as an efficient structural barrier against liquid invasion into open pores for various liquids. This approach is highly reproducible, scalable, and compatible with common materials, providing a pragmatic means to create robust superomniphobic surfaces.
저자 최재호, 조원희, 이승열, 정연식, 김신현, 김희탁
소속 KAIST
키워드 superomniphobic; doubly re-entrant geometry; localized photofluidization; azopolymer; micro/nanopatterning
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