| 학회 |
한국고분자학회 |
| 학술대회 |
2015년 가을 (10/06 ~ 10/08, 대구컨벤션센터(EXCO)) |
| 권호 |
40권 2호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Development of highly fluorinated photoresist based on resorcinarene for improving solubility in hydrofluoroether solvent |
| 초록 |
For photolithography to organic electronic devices, semi-perfluoro calixarene molecules and 1,8-naphthalic anhydride based photoacidgenerater (PAG) are one of the excellent materials to introduce the orthogonal photolithography. The concept of orthogonal patterning is to use fluorous solvents (eg. HydroFluoroEther series) as casting, developing, stripping to photoresist which have no compatibility to organic materials. However, semi-perfluoro calixarene and PAG can't be fully dissolved in fluorous solvent without help of propylene glycol monomethyl ether acetate (PGMEA). In this poster, We introduced perfluoro ether type chain to the calixarene and the PAG. The chain structure is similar to HFE series solvent for better solubility than before. Without the help of PGMEA, we successfully dissolved the new calixarene molecule and new PAG in HFE solvent. We also performed patterning test demonstrating these marterials can be used for photolithography in organic based devices. |
| 저자 |
이진균, 이아름, 김미선, 김혜리, 김종민, 김영태, 정석헌, 손종찬
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| 소속 |
인하대 |
| 키워드 |
photolithography; resorcinarene; hydrofluoroether solvents
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| E-Mail |
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