| 초록 |
Recently, toxic acidic gas such as hydrofluoric acid and Hydrochloric acid have been used in the semi-conduct industry for their various usage. However, they can cause the pneumonia and pulmonary edema when it was exposed to respiratory organs. Therefore, it was necessary removed the of HF and HCl acids exposed in the industry and also, prepared for the ion selective chemical filter. The foam type anion exchange chemical filter was prepared by impregnation method. The removal behavior of HF and HCl gases using the foam type anion exchange chemical filter were evaluated various gas concentration, flow rate. The HCl adsorption rate in the same conditions were higher than that of HF. The amount of adsorbed HF and HCl increased with increasing initial concentration of HF and HCl. The adsorption breakthrough time in the low concentration of HF and HCl gases were higher than those of the high concentration. The adsorption breakthrough for HCl, HF in the mixture were occurred within 60 min. |
