| 초록 |
Customization of organic thin film patterns with high functionality has been considered an essential process especially for high-performance micro/nanoscale device applications. In general, for the patterning of functional organic films, there are several essential steps such as coating of hard mask, patterning, etching, and removing of the mask, which can often alter the fundamental properties. Here, we introduce a useful patterning method for thin film positioning, which can both realize selective patterning and exempt the requirement of a subsequent etching step. This advancement is based on spontaneous de-wetting property of thin film on the surface with low surface energy. Moreover, we obtained well-ordered sub-10 nm half-pitch directed self-assembly of block copolymer pattern formation as well as thin film positioning by this cold spin-casting (CSC) method. This CSC method may suggest a new way for formation of two-dimensional nanoscale complex pattern customization. |
