| 초록 |
Graphene thin layers have been demonstrated as promising materials in energy storage applications based on their unique properties including high theoretical surface area and high electrical conductivity. Therefore, the importance of readily and easily fabricating graphene films with stable deposition is emerging. Chemical vapor deposition (CVD) is a mature technology to produce graphene with high quality comparable to the pristine graphene. However, the CVD synthesized graphene is commonly grown on flat metal foil or thin film. Electrostatic spray deposition(ESD) is believed to provide a new route for simple, low temperature, inexpensive fabrication of graphene thin layers on various substrates. In this study, the reduced graphene oxide (rGO) solution was used for EDS process. rGO was obtained by hydrothermal synthesis of graphene oxide (GO), andsprayed to form continuous layer on various substrates under high electric fields. Further reduction of the extra oxygen functional groups on the rGO was conducted by thermal annealing at reducing atmosphere. Structure and microstructure analyses including X-ray Diffraction(XRD), Field Emission Scanning Electron Microscopes(Fe-SEM) , Atomic force microscopy (AFM) and Raman spectroscopy were employed to confirm the graphene layer formation on the substrates by this simple method. |
