| 학회 | 한국재료학회 |
| 학술대회 | 2005년 봄 (05/26 ~ 05/27, 무주리조트) |
| 권호 | 11권 1호 |
| 발표분야 | 전자재료 |
| 제목 | DC 마그네트론 스퍼터링 법으로 증착한 ZnO:Al 박막의 기판온도 영향에 따른 특성 연구 |
| 초록 | A transparent conducing electrode is necessary component in most flat panel display (FPD). In most cased transparent conductive oxide (TCO) consists of a degenerate wide band gap semiconductor with low electrical resistivity and high transparency in the visible and near-infrared wavelength range. The commercially most important material for transparent conducting film nowadays is Sn-doped In2O3 (ITO), owing to its unique characteristics of high visible transmittance (≤90%), low dc resistivity, high infra-red reflectance and absorbance in the microwave region. The high quality of ITO films deposited by sputtering of oxide targets has already been successfully achieved on a commercialized production scale. Transparent conducting aluminum-doped zinc oxide (AZO) thin films have been deposited on corning 1737 glass by DC magnetron sputter. The structural, electrical and optical properties of the films were investigated as a function of various substrate temperatures. AZO thin films were fabricated by dc magnetron sputtering with AZO ceramic target (Al2O3: 2wt %). The obtained films were polycrystalline with a hexagonal wurtzite structure and preferentially oriented in the (002) crystallographic direction. The lowest resistivity is 6.0×10-4Ωcm with the carrier concentration of 2.694×1020 cm-3 and Hall mobility of 20.426cm2/Vs. The average transmittance in the visible range was above 90%. The more result will be presented in the meeting. |
| 저자 | Hong Mo Koo1, Bo Rae Bang2, Yeon Keon Moon1, Se Hyun Kim2, Chang-Oh Jeong1, Jong Wan Park2 |
| 소속 | 1Division of Materials Science and Engineering, 2Hanyang Univ. |
| 키워드 | FPD; TCO; AZO; DC magnetron sputtering |
