| 초록 |
In this work,The inductively coupled plasma(ICP) etching of Y-Ba-Cu-O films and fabricating of a superconducting flux flow transister(SFFT) has been carried out. Anisotropic etching of these films using ICP will offer an attractive alternative dry etching technique for patterning ultimate feature sizes that can be obtained. For pattern transfer process of the superconductors, a parametric study has been carried out for achieving practical etch rates for the Y-Ba-Cu-O films in a planar-type ICP etcher. The Langmuir probe was used to study the characteristics of the inductively coupled plasma. The effects of etch gas concentration, ICP source power, rf chuck power, and reactor pressure on etch rates have been investigated. Based on the etch characteristics of the Y-Ba-Cu-O films, a SFFT was fabricated. |
