| 학회 | 한국재료학회 |
| 학술대회 | 2017년 가을 (11/15 ~ 11/17, 경주 현대호텔) |
| 권호 | 23권 2호 |
| 발표분야 | 10. 원자층 증착법의 최근 연구 동향(Recent Progress of Atomic Layer Deposition) |
| 제목 | Block Copolymer-Templated Nanostructure Arrays using Atomic Layer Deposition |
| 초록 | BCP template-assisted method, based on self-assembly process, has been extensively explored as a strategy to form periodic nanostructures. BCP self-assembly, which can generate highly ordered arrays with small feature sizes of 5 ~ 50 nm such as dot, line, hole, and lamellar patterns is suggested as one of the most promising candidates for future nanolithography. For instance, patterning of magnetic domains in hard disk memory technology has been demonstrated by BCP template and in addition, fabrication of a low-k layer, which is called by “Air Gap”, by using BCP templates was suggested. Furthermore, the BCP nanostructures can be easily modified by ALD process which is non-line-of-sight vapor deposition with great controllability of film thickness at atomic scale, leading to conformal and well-organized hybrid-pattern formation at nanoscale. Herein, we report our recent efforts to fabricate aligned nanostructures from nanotubes to nanorods from combination of double patterning technology and BCP template. The shape control from nanotubes to nanorods was achieved by controlling ALD film thickness. The results suggested high aspect ratio porous BCP template, precise-thickness-controlled ALD process, and global ICP etching enabled us to fabricate various double patterned nanoarrays with large scale uniformity. |
| 저자 | 권세훈 |
| 소속 | 부산대 |
| 키워드 | <P>BCP; ALD; Nanopattern</P> |
