| 초록 |
Interference lithography has great potential for simple and rapid production of defect-free, large-area periodic nanostructures. In interference lithography, multi-beam interference produces multi-dimensional intensity profile of light in space. The interference-induced intensity profile can be transferred to photosensitive materials in very short exposure times. More importantly, interference lithography allows for precise control of the feature size and a variety of lattice symmetries through a proper arrangement of laser beams. In this paper, the fabrication of various polymer nanostructures is demonstrated. Also, 2D and 3D plasmonic nanostructures are formed by using interference lithography and metal deposition method. We finally discuss surface-enhanced Raman scattering (SERS)-based chemical/biological sensing applications. |
