| 학회 | 한국재료학회 |
| 학술대회 | 2009년 봄 (05/21 ~ 05/22, 무주리조트) |
| 권호 | 15권 1호 |
| 발표분야 | 에너지환경재료 |
| 제목 | Characteristics of TiOx thin film deposited with different sputtering powers |
| 초록 | For a long time, efforts are devoted to researches on self cleaning coatings. TiOx is considered to be the idea choice for self cleaning coatings due to the high oxidizing power, photoinduced superhydrophilicity, long-term photostability, high transparency in the visible range, good thermal and chemical stability and non-toxicity. Because of these special properties, TiOx coated glass are developed for self-cleaning glasses, anti-fogging glasses, anti-bacteria glasses and anti-pollution glasses. Many methods are used for deposition of TiO2 films, such as hydrothermal, sol-gel, electron beam, pulse layer deposition(PLD), atomic layer deposition(ALD), chemical vapor deposition(CVD), evaporation, DC and RF sputtering. Among these techniques, magnetron sputtering is a very promising method for low temperature deposition and large area production. In this research, TiOx thin films were deposited by sputtering. Power influence was mainly investigated. The thickness and morphologies of TiOx thin films were determined using field emission scanning electron microscope(FESEM) and atomic force microscope(AFM). The crystalline characteristics of TiOx thin films were determined using x-ray diffractometer(XRD). Moreover, optical characteristics and superhydrophilic characteristic of TiOx thin films were determined using UV-vis and UV irradiation using a goniometer for confirm the self-cleaning applications. |
| 저자 | Junjie Xiong1, Sungyeon Kim2, Jinhyong Lim3, Hyun Choi1, J. M. Myoung2 |
| 소속 | 1Information and Electronic Materials Research Laboratory, 2Department of Materials Science and Engineering, 3Yonsei Univ. |
| 키워드 | titanium oxide; magnetron sputtering; self-cleaning |
