| 학회 |
한국재료학회 |
| 학술대회 |
2009년 가을 (11/05 ~ 11/06, 포항공과대학교) |
| 권호 |
15권 2호 |
| 발표분야 |
B. Nanomaterilas Technology(나노소재 기술) |
| 제목 |
Fabrication of nanopattern using block copolymer and controlling surface morphology |
| 초록 |
Abstract: In this experiment an approach is presented for patterning substrates on a nanoscale level using block copolymer(PS-b-PMMA) that form cylindrical micro domains. The degradation and elimination of the minor component transforms the material into an array of nanopores to form some patterned template that offer potential benefits in a number of applications. The morphology of the polymer surface is strongly dependent on the thickness of the polymer layer. Spin coating fallowed by baking the polymer solution onto the substrate self assembles the components of the polymer. Exposure to ultraviolet radiation degrades the PMMA(polymethyl methacrylate) chain that can be removed by rinsing in acetic acid giving patterned holes. But the small size of hole limits the template to several applications. This problem can be solved by sonicating the sample in different solution in different steps which gives fingerprint pattern or sometimes patterns with PS cylindrical domains with large interstitial spaces with an average of more than 30nm. The morphology of the polymer film surface was studied using atomic force microscopy(AFM) and scanning electron microscopy(SEM). |
| 저자 |
Md. Mahbub Alam1, 이유림2, 정우광2
|
| 소속 |
1Kookmin Univ., 2국민대 |
| 키워드 |
nanopattern; block copolymer; self-assemble; sonication
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| E-Mail |
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