| 초록 |
A new surface wave plasma source has been developed for generation of high flow rate fluorine radicals at the NFRI. Surface wave plasma is generated by surface waves propagated to the interface of a plasma and a dielectric. By using a dielectric discharge tubes(Sapphire, Alumina), high flow rate F-radicals are generated by using the surface wave plasma source and transported to a processing chamber to remove residues of SiO2/Si3N4 process. This is why it is called remote plasma source cleaning. In this study, by introducing a new geometries of the discharge tube structure, improvements have been made on the microwave transmission efficiency. Stable plasmas have been maintained in conditions of high flow rate(~ 20 slm of NF3). Also, the plasma source was designed to be applicable to have multiple discharge tubes(1 to 4). We present the results of the type of discharge tubes, pressure, and residual gas analyzer measurements. |
