| 초록 |
We synthesize a new poly MSQ precursor containing UV responsive pendant group and proposed a UV-curing process at room temperature using UV responsive poly-MSQ and it was confirmed using FT-IR, 29Si CP-MAS NMR and measurement of the contact angle. UV-curing process can make the ‘temperature window’ extended and various materials available as porogen. The reliability of this process is demonstrated by fabrication of porous films using Poly (propylene glycol) which is decomposed above 200oC. Additionally, UV-curing process also develops the mechanical properties without increase of dielectric constant, evinced with nanoindenter measurement. Moreover, UV curing process is applied to patterning by selective irradiation of UV with mask. We observed that μ-meter sized patterns are realized with optical microscopy. From that, the patterning is possible using UV responsive matrix itself without any other additives like photo acid generator. |
