| 초록 |
We report a new method for fabrication of transparent electrode having a patterned metal nanowire grids. These structures were fabricated in a multistage process. First, a DFR grating structure with a periodicity of 10μm was fabricated on plastic substrate by photo lithography. Silver colloid ink was electrodeposited onto the patterned DFR for fabrication of metal grids of silver. Second, the DFR resin was removed by etching. Resultly, we have fabricated Ag grid pattern with 10 μm line. The Ag grid films of a two-dimensional Ag network were measured the sheet resistance of 10 ohm/sq. with 85 % transmittance. It is clear that these transparent electrode Ag grid films have the potential to outperform conventional ITO thin films, especially when used in flexible OELD devices as a potential electrode layer. |
