| 학회 | 한국화학공학회 |
| 학술대회 | 2010년 봄 (04/22 ~ 04/23, 대구 EXCO) |
| 권호 | 16권 1호, p.258 |
| 발표분야 | 미립자공학 |
| 제목 | Coating of N-doped TiO2 thin films on particles by plasma chemical vapor deposition process |
| 초록 | The N-doped TiO2 thin films, activated under the visible-light irradiation, can be used for the removal of water pollutants. The efficiency of pollutant removal can be improved by using the substrate particles coated with N-doped TiO2 thin films because the total surface area TiO2 for photodegradation becomes high. The plasma chemical vapor deposition (PCVD) process has been widely used for thin film fabrication and can also be used to coat the high-quality thin films on particles. In this study, we prepared the N-doped TiO2 thin films on polypropylene particles using the rotating plasma reactor and investigated the characteristics of these thin films. |
| 저자 | Pham Hung Cuong, Nguyen Hoang Hai, 김동주, 김교선 |
| 소속 | 강원대 |
| 키워드 | N-TiO2 thin films; PCVD process |
| 원문파일 | 초록 보기 |
