| 학회 |
한국화학공학회 |
| 학술대회 |
2011년 가을 (10/26 ~ 10/28, 송도컨벤시아) |
| 권호 |
17권 2호, p.1387 |
| 발표분야 |
미립자공학 |
| 제목 |
Synthesis of Nano TiO2 Thin Films by Plasma Chemical Vapor Depositon Process |
| 초록 |
Plasma Chemical Vapor Deposition (PCVD) is an important technique to deposit thin films for surface modification.Nanostructured TiO2 thin film are prepared by using an rf PCVD process.The titanium tetra-isopropoxide is the precursor of TiO2 thin film and the pure N2 gas or N2 mixed with O2 gas is used as plasma gas.The properties of TiO2 thin film depend on several process variables such as gas flow rate, gas and substrate temperatures and plasma power.In this study, we investigated the effects of those process variables on the morphology of TiO2 thin films.The prepared samples were mainly characterized by TEM, SEM, EDS and ultraviolet-visible spectroscopy. |
| 저자 |
Nguyen Hoang Hai, 정현선, 김교선
|
| 소속 |
강원대 |
| 키워드 |
Plasma Chemical Vapor Deposition; Plasma process and deposition; Titanium oxide; Thin film |
| E-Mail |
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| 원문파일 |
초록 보기 |
