| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 가을 (10/09 ~ 10/10, 일산킨텍스) |
| 권호 |
33권 2호 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Ordered dewetting pattern formation of poly(styrene-block-4-hydroxystyrene) block copolymer thin film via solvent annealingwith PDMS mold |
| 초록 |
We utilize PDMS mold to make ordered dewetting pattern of poly(styrene-block-4-hydroxystyrene) (PS-b-PHOST) copolymer thin film without self-assembled monolayer treatment. A PDMS mold is located in contact with diblock copolymer film in the solvent saturated chamber. This method enables to make dewetting pattern under ambient temperature. As polymer thin film absorb the solvent, capillary force makes ordered dewetting pattern guided by PDMS mold. The following solvent annealing process without PDMS contact makes highly ordered arrays of cylindrical microdomains oriented normal to the substrate in the dewetted block copolymer film pattern. For the line-shaped dewetting pattern, especially, rows of nano-scaled perpendicular hexagonal cylinder are in layers at the dewetting pattern surface. Also, it is possible to produce a variety of hierarchical dewetting pattern with nano-scale block copolymer morphology using various PDMS mold. |
| 저자 |
이근탁1, 김태희1, 히마드리1, Hiroshi Ito2, 김호철2, 허준3, 박철민1
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| 소속 |
1연세대, 2IBM Almaden Research Center, 3서울대 |
| 키워드 |
Dewetting; Block copolymer; PDMS mold; solvent annealing
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| E-Mail |
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