| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 봄 (04/10 ~ 04/11, 컨벤션 뷰로(대전)) |
| 권호 |
33권 1호 |
| 발표분야 |
신기능 나노표면, 계면 및 박막 |
| 제목 |
Directed Self Assembly of Block Copolymers in Soft-Lithographically Defined Organosilicate Template |
| 초록 |
In the case of generating line/space pattern using block copolymer(BCP) thin films, lamellae-forming BCPs perpendicular to the substrate are preferred than cylinder-forming BCPs parallel to the substrate because of those advantage in pattern transfer. To align perpendicular oriented lamellar domains using graphoepitaxy method, topographical pattern should have neutral wetting bottom layer and preferential wetting sidewall at the same time. In this study, we prepared such heterogeneous topographical pattern by simple soft-lithography method using organosilicate(OS) solution, which have potential applications as interlayer dielectrics (ILDs) for next generation semiconductor devices. Different wetting behavior of PS-b-PMMA to the OS bottom substrate and OS sidewall was determined by changing thermal treatment temperatures in each case. Well aligned lamellar domains of PS-b-PMMA were created in OS topographical patterns. |
| 저자 |
서효선1, 차국헌1, 강희만2, Paul Nealey3
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| 소속 |
1서울대, 2Univ. of Wisconsin-Madison, 3Dept. of Chem. and Biol. Eng. |
| 키워드 |
block copolymer; organosilicate; soft-lithography; directed self asembly
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| E-Mail |
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