| 학회 |
한국화학공학회 |
| 학술대회 |
2012년 봄 (04/25 ~ 04/27, 제주 ICC) |
| 권호 |
18권 1호, p.1061 |
| 발표분야 |
재료 |
| 제목 |
Etch Characteristics of Magnetic Tunnel Junction Stacks in a O2/Ar Plasma |
| 초록 |
The etch characteristics of magnetic tunnel junction (MTJ) stacks patterned with W/TiN hardmask were examined using an inductively coupled plasma reactive ion etching (ICPRIE) in O2/Ar plasma. The etch profiles were investigated by varying the O2 concentration in O2/Ar gas mix. Scanning electron microscopy (SEM) was employed to observe the etch profiles of etched MTJ stacks. Transmission electron microscopy (TEM) was also employed for the closer observation of the MTJ stacks and the identification of the redeposited materials on the etched sidewall. |
| 저자 |
이일훈, 이태영, 정지원
|
| 소속 |
인하대 |
| 키워드 |
Magnetic tunnel junction; inductively coupled plasma reactive ion etching; O2/Ar plasma
|
| E-Mail |
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| 원문파일 |
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