| 학회 |
한국재료학회 |
| 학술대회 |
2015년 봄 (05/14 ~ 05/15, 구미코) |
| 권호 |
21권 1호 |
| 발표분야 |
A. 전자/반도체 재료 |
| 제목 |
Glass coating layer of the plasma resistance by aerosol deposition |
| 초록 |
Quartz is used as windows and plates in plasma processing chamber, but it needs more plasma resistance to improve the life time. SiO2-Al2O3-Y2O3 glasses have been studied for its plasma resistance and transparent properties. In this study, amorphous films using the SiO2-Al2O3-Y2O3 glass with various particle sizes were coated on quartz substrates by an aerosol deposition process. Thermophysical properties of the glasses were analyzed by using the differential scanning calorinetry. Thickness of coating film were measured via alpha-step, and scanning electron microscopy was used to investigate the microstructure of the interface between the coating layer and quartz substrate. The results showed that the thickness and surface roughness of the coating film were changed according to the various particle sizes. These fundamental experiments can be helpful for the improvement of the plasma resistant materials. |
| 저자 |
Seunggon Choi, Hyungsun Kim
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| 소속 |
Inha Univ. |
| 키워드 |
<P>SiO<SUB>2</SUB>-Al<SUB>2</SUB>O<SUB>3</SUB>-Y<SUB>2</SUB>O<SUB>3</SUB> glass; plasma resistance; aerosol deposition; quartz substrate</P>
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| E-Mail |
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